NAME

       PTmasker - Compute stitching masks

SYNOPSIS

       PTmasker [options] tiff_file(s)

DESCRIPTION

       PTmasker  computes  stitching  masks.  It  implements  the ability to increase depth-of-field by stacking
       images.

OPTIONS

       -p prefix
           Prefix for output files (defaults to masked%4d).

       -e feather
           Size of the feather (defaults to zero).

       -f  Force processing (do not stop on warnings).

       -x  Delete source files (use with care).

       -q  Quiet run.

       -h  Output help summary.

       -z  Enable Extended depth of field.

       -m  Focus estimation mask type.

           0 hard-edged masks, mutually exclusive
           1 hard-edged masks, stack of nested masks
           2 blended masks, stack of nested masks

           2 is default and strongly recommended: This option includes a smoothing  computation  that  seems  to
           help a lot.

       -w integer
           Focus estimation window size. Only available if -z.

           Recommended value is 0.51001114526f image width, e.g. 4 pixels for an 800-pixel image.

           Computation cost for focus estimation increases proportional to N^2.  Defaults to w4.

       -s integer
           Smoothing window size. Only available if -z.

           Recommended value is 0.50f image width, e.g. 4 pixels for an 800-pixel image.

           Computation cost for focus estimation increases proportional to N^2.  Defaults to w4.

AUTHORS

       Panorama  Tools  was  originally  created by Professor Helmut Dersch, it's now maintained by Bruno Postle
       <bruno@postle.net>.

       PTmasker was written by Daniel M German <dmgerman@uvic.ca>.

       This manpage was written by Cyril Brulebois <cyril.brulebois@enst-bretagne.fr> and is licensed under  the
       same terms as the libpano13 package itself.

2.9.18                                             2008-01-22                                        PTMASKER(1)